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Pororoca

Pororoca is AIR WATER MACH’s newest brand of O-rings for LCD and semiconductor manufacturing equipment. We are establishing a firm foothold in high-tech fields including the semiconductor industry to cope with severe chemical environments and requirements such as heat resistance, chemical resistance, and plasma resistance.

Features

  • Excellent heat resistance

    By introducing a special FFKM polymer with the highest heat resistance, we offer a heat-resistant grade that can be used in high-temperature processes.

  • Specialized for low particle and low outgassing

    Damage from plasma is reduced by mixing special filler in particle emission, which is the cause of decreased yield in semiconductor and FPD manufacturing processes. The series also includes grades that minimize emission gas leakage from sealing parts, which is another cause of decreased yield.

  • Extensive lineup

    With our long-standing manufacturing know-how and original formulating technology, we offer an extensive lineup that provides you with optimum materials suitable for a variety of applications. You may also increase cost performance with the support of products from our existing lineup.

  • Specialized for a variety of resistance properties (solvents, chemicals, low metal elution, low adhesion, etc.)

    In addition to grades with superior resistance to solvents and low metal elution, we can also provide a wide range of materials with resistance to various chemicals.

Lineup

You can choose materials according to your process requirements.

Pororoca 875B

  • Extensive chemical resistance (including amine, steam, and ozone)
  • Long-lasting sealing performance and excellent mechanical properties

Pororoca 251B

  • Balanced heat resistance / chemical resistance performance (Standard heat resistance: 320°C)

Pororoca 252W

  • Heat resistant, non-carbon material (Standard heat resistance: 300°C)

Pororoca G80C

  • Contains no metallic filler, providing excellent purity

Pororoca IOTA

  • General purpose fluororubber optimized for low outgassing performance

Seal Selection Guide for Semiconductor Use

Process Use / Device Recommended Material Material Characteristics
A）Lithography
Resist coating / development
  • Resist tube seal
  • Chemical line seal

    Coater & developer

 875B
  • Excellent chemical resistance
B）Etching / Ashing
Wet process
  • Chemical line seal

    Etching equipment

 875B
  • Excellent chemical resistance
Dry process
  • As a component inside the chamber
    Chamber lid seal
    Gate valve, etc.

    Plasma etching equipment

    Plasma ashing equipment

 251B
252W
  • Excellent heat resistance and plasma resistance characteristics
C）Cleaning / Resist Separation
Resist stripping
  • Chemical line seal

    Resist stripping

  • Chemical line seal
  • Filter

    Cleaning equipment

 875B
  • Excellent chemical resistance
Cleaning G80C
  • Excellent purity
D）Oxidation / Diffusion
 
  • Furnace seal

    Oxidizing / diffusion furnace

    Lamp annealing equipment

 251B
  • Excellent heat resistance
E）Electrode / Wiring
 
  • Chamber seal

    Sputtering equipment

    Metal CVD equipment

 251B
  • Excellent heat resistance
F）Insulating Film Formation
 
  • Chamber seal

    (Plasma) CVD equipment

    LP-CVD equipment

 IOTA
  • Excellent heat resistance
  • Low gas emission
G）Polishing
Chemical/physical polishing
  • Chamber seal
  • Chemical line seal

    CMP equipment

 875B
  • Excellent chemical resistance

Series Physical Properties List

Property name\Normal physical property Color Heat resistance
℃		 Hardness
Shore A		 Tensile strength
MPa		 100％
Tensile stress
MPa		 Elongation
％		 Compression set
JIS test specimen
200°C 70 h
％		 Compression set
O-ring
200℃70H
％		 Compression set
O-ring
250℃70H
％		 Compression set
O-ring
300℃70H
％		 Outgas quantity
200℃
μg/g
Test conditions － － JIS
K6253		 JIS K6251 JIS K6262
Compression ratio: 25％		 O-ring：P25
Compression ratio: 25％		 －
Pororoca
875B		 Black 220 75 16.5 6.3 180 12 18 － － －
Pororoca
251B		 Black 320 75 21 8.7 210 16 18 － 39 －
Pororoca
252W		 White 300 75 18 7.1 260 － 33 － 63 －
Pororoca
G80C		 Amber 220 80 19.3 3.5 430 － 54 － － －
Pororoca
IOTA		 Black 220 75 15.8 4.7 246 10 － － － 9.0

Series Resistance List

  • [Usage]
  • +++：Recommended
  • ++：Applicable
  • +：Applicable depending on location
  • NR：Not recommended
Material name＼Item Base polymer Recommended use
D：dry
W：wet		 Heavy metal elution Heat-generated gas Chemical resistance Plasma resistance
Organic acids Inorganic acids Amine Solvents High concentration ozone Oxygen Halogen
Pororoca
875B		 FFKM D/W ++ ++ +++ +++ +++ +++ +++ ++ ++
Pororoca
251B		 FFKM D/W + ++ +++ +++ +++ +++ +++ ++ ++
Pororoca
252W		 FFKM D － ++ － － － － － ++ +++
Pororoca
G80C		 FKM D +++ + － － － － － + +
Pororoca
IOTA		 FKM D － +++ － － － － － + +
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